Spongy TiO2 layers deposited by gig-lox sputtering processes: Contact angle measurements

Biocompatibility and Surface Properties of TiO2 Thin Films Deposited by DC Magnetron Sputtering

We present the study of the biocompatibility and surface properties of titanium dioxide (TiO₂) thin films deposited by direct current magnetron sputtering. These films are deposited on a quartz substrate at room temperature and annealed with different temperatures (100, 300, 500, 800 and 1100 °C). The biocompatibility of the TiO₂ thin films is analyzed using primary cultures of dorsal root gang...

Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering

Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wett...

Nb-B-C thin films for electrical contact applications deposited by magnetron sputtering

Structural, mechanical and electrical-contact properties of nanocrystalline-NbC/amorphous-C coatings deposited by magnetron sputtering

Niobium-carbide nanocomposite coatings with a carbon content varying from 43 – 64 at.% were deposited by dual DC magnetron sputtering. X-ray diffraction, x-ray photoelectron spectroscopy and electron microscopy showed that all coatings consisted of nanometer sized NbC grains embedded in a matrix of amorphous carbon. Mechanical properties and electrical resistivity showed a strong dependency on ...

ANATASE – RUTIL TiO2 THIN FILMS DEPOSITED IN A D.C. MAGNETRON SPUTTERING SYSTEM

Anatase TiO2 thin films were deposited in a d.c. reactive magnetron sputtering system. It was found that there is a strong dependence between anatase-rutil structures of TiO2 films and the technological conditions, the most relevant parameter being the oxygen percentage from the argon and oxygen mixture. Our measurements carried out for electrical properties of d.c. magnetron sputtering TiO2 th...